Lang Zeng, Beihang University, China
Xuefei Li, Huazhong University of Science and Technology, China
Xiaolei Wang, Institute of Microelectronics, Chinese Academy of Sciences, China
Wangran Wu, Southeast University, China
Pengpeng Ren, Shanghai Jiao Tong University, China
Xin Sun, NAURA Microelectronics, China
Zongwei Wang, Peking University, China
Dunbao Ruan, Fuzhou University, China
Huiyun Li, Shenzhen University of Advanced Technology, China
Ruiguang Zhao, Northwestern Polytechnical University, China
Ziyue Zhang, Beijing Institute of Technology, China
Zhizhan Yang, Southwest Jiaotong University, China
Tao Su, Sun Yat-Sen University, China
Zhiguo Yu, Jiangnan University, China
Xiaoying Deng, Shenzhen University, China
Deming Zhang, Beihang University, China
Maliang Liu, Xidian University, China
Aili Wang, Zhejiang University, China
Yishu Zhang, Zhejiang University, China
Wan'ang Xiao, Institute of Semiconductors, Chinese Academy of Sciences, China
Meilin Wan, Hubei University, China
Xuan Guo, Institute of Microelectronics of the Chinese Academy of Sciences, China
Yueting Li, Beihang University, China
Ke Chen, Nanjing University of Aeronautics and Astronautics, China
Pei-Yu Lee, Synopsys, China
Pingqiang Zhou, ShanghaiTech University, China
Jie Han, University of Alberta, Canada
Yi Zou, South China University of Technology, China
SangHoon Shin, Hanyang University, South Korea
Chang Niu, National University of Singapore, Singapore
He Zhang, Beijing University of Aeronautics and Astronautics, China
Zhengdong Luo, Xidian University, China
Bi Wu, Nanjing University of Aeronautics and Astronautics, China
Cheng Tu, University of Electronic Science and Technology of China, China
Weipeng Xuan, Hangzhou Dianzi University, China
Pengcheng Jiao, Zhejiang University, China
Feng Zhou, Nanjing University, China
Jiaxing Wei, Southeast University, China
Meng Zhang, Beijing University of Technology, China
Feng Lin, Hangzhou Silan Microelectronics Co., Ltd.
Kui Xiao, CSMC Technologies Corporation, China
Wei Lin, SiEn (Qingdao) Integrated Circuits Co., Ltd., China
Pengyu Lai, Southeast University, China
Yuxiang Chen, University of Arkansas, United States
Xiaoli Tian, Institute of Microelectronics of the Chinese Academy of Sciences, China
Hengyu Wang, Zhejiang University, China
Wen Liu, Xi'an Jiaotong-Liverpool University, China
Xiaochuan Deng, University of Electronic Science and Technology of China, China
Hongbo Ma, Southwest Jiaotong University, China
Min Gong, Sichuan University, China
Yongqiang Cai, Beijing Normal University, China
Man Hoi WANG, The Hong Kong University of Science and Technology, Hong Kong, China
Weijia Zhang, The Hong Kong University of Science and Technology, Hong Kong, China
Yi Zhang, The Hong Kong Polytechnic University, Hong Kong, China
Zihui Zhang, Guangdong University of Technology, China
Ziyuan Liu, Shanghai Institute of IC Materials, China
Yamin Zhang, Beijing University of Technology, China
Xufang Zhang, North China University of Technology, China
Ronghua Wang, Rivotek, China
Chunhua Zhou, Pinghu Laboratory, China
Guanhua Yang, Institute of Microelectronics of the Chinese Academy of Sciences, China
Guangwei Xu, University of Science and Technology of China, China
Chao Liu, Shandong University, China
Xinbo Zou, ShanghaiTech University, China
Xi Tang, Anhui University, China
Longfei Liang, Hangzhou Silan Microelectronics Co., Ltd., China
Wei-Han Yu, University of Macau, Macau, China